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OSU patents water-based process to separate zirconium and hafnium with higher efficiency

Phys.org1 min read114 words
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Oregon State University researchers have secured a patent for an innovative method that separates two metals essential to the semiconductor and atomic‑energy sectors in their ultra‑pure forms. The new technique, described as more environmentally friendly, replaces conventional processes that rely on hazardous chemicals and generate significant waste, offering a cleaner alternative for producing the high‑purity materials demanded by advanced electronics and nuclear applications.

The university’s development is expected to streamline production while reducing ecological impact, potentially lowering costs for manufacturers that depend on these critical metals. By improving the efficiency of metal purification, the patented process could enhance supply chain reliability for the semiconductor industry and support the safe, sustainable operation of atomic‑energy facilities.

Read the original at Phys.org

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